Improving The Quality Of Micro Holes Drilled With A Current Detection Plasma Arc Device

Abstract

Today, microholes play a crucial role in many sectors. Microholes are used in fields such as aerospace, computer systems, and electronic and mechanical industries. In this paper, we improve the performance of the current sensing plasma arc device to create holes within the same diameter, appropriate delamination, and surface quality. In addition, we aim to improve the processing quality of the current sensing plasma arc device, which drills holes from the micron level to the millimeter level and creates microstructures on hard, durable, and inert materials such as glass and quartz. Additionally, we presented a multiobjective optimization model to reach the optimal factor levels to obtain the minimum hole diameter with minimum delamination. For this objective, we propose a design of an experiment-integrated goal programming model in this study. The optimal levels are 90 Watt, 18 Hz, 2.73 ms, and 11.6 cm for the parameter values Power, Frequency, Lead time, and Distance between the probes, respectively, to reach the optimal diameter (183 mu m) and delamination values (1.025).